Laboratory Spin Coating System For Silicon Wafers
Laboratory Spin Coating System For Silicon WafersElectronic Micro Systems supplies the EMS 6000 photo resist spinner for accurate, repeatable coating of silicon wafers and flat substrates. Designed for semiconductor manufacturing, research laboratories, and cleanroom applications, it delivers precise spin coating performance, dependable operation, and cost-effective processing for thin film and photoresist applications.
Visit the Electronic Micro Systems website for more information on Laboratory Spin Coating System For Silicon Wafers