Large Area Laboratory Hot Plate for 200mm Wafer Processing
The EMS 1200 Hot Plate provides a generous 250 ? 250 mm heating surface, making it ideal for larger substrates and batch wafer preparation. With uniform heat distribution and rapid ramp rates, it supports demanding semiconductor and microelectronics applications.
Visit the Electronic Micro Systems website for more information on Large Area Laboratory Hot Plate for 200mm Wafer Processing
ENQUIRY FORM
